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Koji Kita
HIndex: 19
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Copper
Scattering
Interface
CMOS
Kinetics
Leakage
Thin film
Gold
Electric field
Field-effect transistor
High-κ dielectric
Silicon
Germanium
Logic gate
Annealing
Dielectric
Band gap
Materials Science
Thin-film transistor
Electron mobility
Contact resistance
Redox
Conductivity
Energy level
Threshold voltage
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Copper
Scattering
Interface
CMOS
Kinetics
Leakage
Thin film
Gold
Electric field
Field-effect transistor
High-κ dielectric
Silicon
Germanium
Logic gate
Annealing
Dielectric
Band gap
Materials Science
Thin-film transistor
Electron mobility
Contact resistance
Redox
Conductivity
Energy level
Threshold voltage
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Match this author profile with one of the following researchers:
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Affiliation
Papers
Koji Kita
Kobe University
149
Koji Kita
Nara Institute Of Science And Technology
2
Koji Kita
Kanazawa University
1
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