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Eiji Takeda
HIndex: 19
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Lithography
Electrode
Dissipation
Metallizing
Soft error
Voltage
Impurity
Hot-carrier injection
Chip
Threshold voltage
Capacitor
Short-channel effect
Cathode ray
Stress
Degradation
Chemical vapor deposition
Field-effect transistor
Electronic circuit
Gold
Silicon
Leakage
Fabrication
Impact ionization
Dynamic random-access memory
Very-large-scale integration
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Lithography
Electrode
Dissipation
Metallizing
Soft error
Voltage
Impurity
Hot-carrier injection
Chip
Threshold voltage
Capacitor
Short-channel effect
Cathode ray
Stress
Degradation
Chemical vapor deposition
Field-effect transistor
Electronic circuit
Gold
Silicon
Leakage
Fabrication
Impact ionization
Dynamic random-access memory
Very-large-scale integration
Paper Recommendation
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Match this author profile with one of the following researchers:
Author Name
Affiliation
Papers
Eiji Takeda
Hitachi
171
Eiji Takeda
Kobe University
135
Eiji Takeda
Department Of Biotechnology
83
Eiji Takeda
University Of Tokushima
14
Eiji Takeda
Kobe University
13
Eiji Takeda
University Of Tokushima
10
Eiji Takeda
Kyushu University
4
Eiji Takeda
Iwate University
2
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