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R Jammy
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Logic gate
Atomic layer deposition
Thermal stability
Silicon
Field-effect transistor
International System of Units
Contact resistance
Annealing
Dielectric
Electrode
CMOS
Metal
Stress
Degradation
Leakage
Doping
Resistance
Threshold voltage
Work function
High-κ dielectric
Equivalent oxide thickness
Thin film
Tin
Electron mobility
Temperature
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Logic gate
Atomic layer deposition
Thermal stability
Silicon
Field-effect transistor
International System of Units
Contact resistance
Annealing
Dielectric
Electrode
CMOS
Metal
Stress
Degradation
Leakage
Doping
Resistance
Threshold voltage
Work function
High-κ dielectric
Equivalent oxide thickness
Thin film
Tin
Electron mobility
Temperature
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R Jammy
Sematech
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